Hafnium Sputtering Targets (Hf)

Hafnium Sputtering Targets (Hf) Information

Hafnium, symbol Hf, atomic number 72, atomic weight 178.49. The element is a shiny silver-gray transition metal.The melting point is 2227 ℃, the boiling point is 4602 ℃, it is insoluble in water, and the density is 13.31 g/cm3. Hafnium is a plastic metal and becomes hard and brittle when impurities are present. It is stable in air and only darkens on the surface when burned. The filament can be ignited with the flame of a match. Properties similar to zirconium. It does not react with water, dilute acid or strong alkali, but is easily soluble in aqua regia and hydrofluoric acid.

Our hafnium target up to 99.95%. Low gas content and uniform particle size distribution.

Hafnium targets are widely used in physical evaporation deposition, magnetron sputtering and other technologies to prepare various thin film materials, such as oxides, nitrides, silicides and metals. In semiconductor manufacturing, hafnium targets are often used to prepare thin film materials such as silicon, silicon nitride, aluminum oxide, and zirconium oxide. These thin film materials play an important role in semiconductor devices, such as improving device stability and performance. In display manufacturing, hafnium targets are often used to prepare transparent electrode materials, such as indium tin oxide (ITO) and zinc oxide (ZnO).

We sell these different shape hafnium metal materials by unit weight or piece for different use in research area and for new proprietary technologies.Actual prices can vary and may be higher or lower, as determined by availability and market fluctuations. To speak to someone directly about current pricing, please click inquiry.

Hf-3N5-COA